Patent · US Expired

Method and apparatus for producing beneficial stresses around apertures by use of focused stress waves

US6389865B1 · kind B1 · utility

8Cited by
22References
52Claims
0Family size

Assignee

Inventor

Key dates

Filing dateMar 16, 1999
Grant dateMay 21, 2002
Priority date
Expiry dateMar 16, 2019

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC21D2221/00
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

Tooling and a method of employing tooling to produce beneficial stress waves in a substrate to provide high fatigue life structures. Stress waves are provided to work a substrate, causing dimples in the workpiece, along a uniform pressure profile in the workpiece. By use of the method, uniform beneficial residual stress is provided at surface and midplane apertures in a workpiece, so as to improve overall fatigue life. An improved tool shape is described, having a smooth curve, rather than a flat punch. Also, the use of a consumable wafer provides additional uniform stress profile benefits.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.