Method of filling an embroidery stitch pattern with satin stitches having a constant interstitch spacing
US6390005B1 · kind B1 · utility
Inventors
Key dates
| Filing date | May 14, 1998 |
| Grant date | May 21, 2002 |
| Priority date | — |
| Expiry date | May 14, 2018 |
Classification
- Technology area (CPC D)Textiles; Paper
- CPC primaryD05B19/08
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
A method of filling a defined embroidery pattern shape, with the shape comprising a curve defining the shape, fills the pattern shape with a plurality of turning satin-like embroidery stitches which turn to follow the defined shape. In carrying out the method, the density inset for the next adjacent satin-like embroidery stitch is dynamically varied in accordance with any change in the defined shape from the previous stitch, taking into account the stitch length and stitch angle. The process is iteratively repeated , using the predefined perpendicular distance from the previous stitch end point to the new stitch end point until the defined shape is completely filled.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.