Exhaust device for use in a clean room, cleanroom, and method
US6390755B1 · kind B1 · utility
1Cited by
11References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 6, 2000 |
| Grant date | May 21, 2002 |
| Priority date | — |
| Expiry date | Apr 6, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67017
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
In a single cleanroom (200) for first (230) and second (240) wafer processing machines, an exhaust device (260) surrounds the second machine (240) that temporarily produces exhaust gas (250) which is detrimental to the processes in the first machine (230). Additionally to a first directed air flow (220) available in the cleanroom (200), the exhaust device (260) generates—in the proximity of gas leakage openings of the second machine (240)—a second air flow (270) that prevents the exhaust gas (250) from further being moved by the first air flow (220) to the first machine (230).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.