Methods and apparatus for forming submicron patterns on films

US6391217B2 · kind B2 · utility

Assignees

• University of Massachusetts · US
• University of Konstanz · DE

Inventors

• Erik Schaffer · Konstanz, DE
• Jurgen Mlynek · Radolfzell, DE
• Ullrich Steiner · Groningen, NL
• Thomas Thurn-Albrecht · Glückstadt, DE
• Thomas P. Russell · San Jose, US

Key dates

• Filing date: Dec 22, 2000
• Grant date: May 21, 2002
• Expiry date: Dec 22, 2020

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T428/24521
• WIPO field: Micro-structural and nano-technology
• WIPO sector: Chemistry

Abstract

A method for forming a patterned film on a substrate, the method including: providing a first flowable medium on the substrate and a second flowable medium on the first flowable medium, the first and second flowable media having different dielectric properties and defining an interface there between; applying an electric field to the interface for a time sufficient to produce a structure in the first flowable medium along the interface; and hardening the structure in the first flowable medium to form the patterned film.