Fiducial beam position monitor
US6392242B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | May 27, 1999 |
| Grant date | May 21, 2002 |
| Priority date | — |
| Expiry date | May 27, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/30438
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A fiducial beam monitor includes a patterned diode layer on a semiconducting substrate. An electrical field between the diode (or diodes) on the diode layer and the semiconducting substrate modulates the size of the depletion layer formed by the diode or diode. A high energy beam incident upon a diode on the diode layer produces a greater current than a high energy beam incident upon a non-diodic region of the same layer. In use, the beam monitor is typically fixed to the backside of a workpiece such as a semitransparent membrane being patterned by a focused high energy beam that is translated with respect to workpiece and attached monitor. The changes in current during translation are then correlated with the position of the beam with respect to the pattern on the diode layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.