Method of forming metal colloids, metal colloids and method of forming a metal oxide sensitive layer for a chemical sensor device
US6395053B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | May 28, 1999 |
| Grant date | May 28, 2002 |
| Priority date | — |
| Expiry date | May 28, 2019 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB22F2998/00
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method of forming a metal colloid comprising a plurality of particles, each particle comprising a core of a metal, is described. The method comprises the steps of providing an organometallic precursor comprising the metal, combining the organometallic precursor and a solvent, which comprises water molecules, heating the combination of organometallic precursor and solvent so that the organometallic precursor decomposes to form a solution including the metal colloid and by-products, and removing the by-products to provide the metal colloid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.