Patent · US Expired

Method of forming metal colloids, metal colloids and method of forming a metal oxide sensitive layer for a chemical sensor device

US6395053B1 · kind B1 · utility

26Cited by
2References
10Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 28, 1999
Grant dateMay 28, 2002
Priority date
Expiry dateMay 28, 2019

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB22F2998/00
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A method of forming a metal colloid comprising a plurality of particles, each particle comprising a core of a metal, is described. The method comprises the steps of providing an organometallic precursor comprising the metal, combining the organometallic precursor and a solvent, which comprises water molecules, heating the combination of organometallic precursor and solvent so that the organometallic precursor decomposes to form a solution including the metal colloid and by-products, and removing the by-products to provide the metal colloid.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.