System and method for purifying and distributing chemical gases
US6395064B1 · kind B1 · utility
7Cited by
20References
38Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 26, 1999 |
| Grant date | May 28, 2002 |
| Priority date | — |
| Expiry date | Oct 26, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E60/32
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Provided is a novel system for vaporizing and purifying a gas to produce ultrapure chemical gases employed at a semiconductor processing facility. The system includes a liquified gas source, a vaporization purification bed, and a buffer tank. The liquefied gas source is in communication with the vaporization purification bed to provide a liquefied gas to the bed with an ultra-pure chemical gas generated in the purification bed. The purified gas is subsequently routed to a buffer tank and to a point of use therefrom.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.