Fluoride crystalline optical lithography lens element blank
US6395657B2 · kind B2 · utility
11Cited by
4References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 16, 2001 |
| Grant date | May 28, 2002 |
| Priority date | — |
| Expiry date | Apr 16, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S501/90
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention provides a high quality identifiable fluoride crystalline optical microlithography lens element blank for formation into an lens element of a microlithography system. The highly qualified fluoride crystalline characteristics of the fluoride optical lithography lens blank ensure its beneficial performance in the demanding microlithography manufacturing regime which utilizes high energy short wavelength ultraviolet laser sources. The fluoride crystalline optical lithography lens element blanks are comprised of multiple adjoining abutting crystalline subgrains with low boundary angles.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.