Exposure apparatus
US6396563B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 12, 2001 |
| Grant date | May 28, 2002 |
| Priority date | — |
| Expiry date | Jan 12, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03B27/42
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus comprises mask support portions, which support photo masks each having an exposure pattern thereon for movement between an exposure position in which the masks are in contact with a to-be-exposed object and a separate position in which the masks are kept off the object. Exposure light sources are used to expose the to-be-exposed object through the photo masks that are located in the exposure position. A clean air supplier runs clean air from a first supply portion into regions between the to-be-exposed object and the photo masks to prevent penetration of foreign substances when the photo masks are moved to the separate position. When the photo masks are moved to the exposure position, the supplier feeds clean air from a second supply portion onto the respective outer surfaces of the photo masks, thereby cooling the photo masks.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.