Optical wavelength division multiplexer/demultiplexer having patterned opaque regions to reduce optical noise
US6396978B1 · kind B1 · utility
17Cited by
6References
5Claims
0Family size
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Key dates
| Filing date | Oct 20, 2000 |
| Grant date | May 28, 2002 |
| Priority date | — |
| Expiry date | Oct 29, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S439/931
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A patterned opaque layer is applied between adjacent filters mounted on a common optical block surface in a wavelength division multiplexer and demultiplexer. The patterned opaque layer covers the optically transparent regions between adjacent filters mounted on the common surface of the optical block. The patterned opaque layer is also applied around the perimeter of the footprint of the array of filters mounted on the common surface of the optical block. The patterned opaque layer reduces cross-talk between the filters and reduces optical noise.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.