Apparatus for large area chemical vapor deposition using multiple expanding thermal plasma generators

US6397776B1 · kind B1 · utility

Assignee

• General Electric Company · US

Inventors

• Barry L. Yang · Dublin, US
• Charles D. Iacovangelo · Niskayuna, US
• Kenneth Browall · Saratoga Springs, US
• Steven M. Gasworth · Scotia, US
• William A. Morrison · Albany, US
• James Neil Johnson · Scotia, US

Key dates

• Filing date: Jun 11, 2001
• Grant date: Jun 4, 2002
• Expiry date: Jun 11, 2021

Classification

• Technology area (CPC H): Electricity
• CPC primary: H05H1/44
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

Chemical vapor deposition is performed using a plurality of expanding thermal plasma generating means to produce a coating on a substrate, such as a thermoplastic and especially a polycarbonate substrate. The substrate is preferably moved past the generating means. Included are methods which coat both sides of the substrate or which employ multiple sets of generating means, either in a single deposition chamber or in a plurality of chambers for deposition of successive coatings. The substrate surfaces spaced from the axes of the generating means are preferably heated to promote coating uniformity.