Chemical processing using a dual feeder system, a sample port assembly, and a fluid flow control system
US6399029B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 24, 1997 |
| Grant date | Jun 4, 2002 |
| Priority date | — |
| Expiry date | Mar 24, 2017 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01P2004/50
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Components of a chemical processing system are disclosed. In particular, a chemical processing system is disclosed which includes a chemical mixing or reacting zone, an inlet to the zone, an outlet to the zone, and a vacuum or fluid flow source located downstream of the outlet. The chemical processing system further includes a device to control the amount of vacuum or fluid flow through the zone. Also disclosed is a continuous feeder system having a first loss-in-weight and a second loss-in-weight feeder and a device for measuring a lower limit of feed in each feeder. There is also a device to activate the second feeder when the lower limit is obtained in the first feeder and a device to deactivate the first feeder when the lower limit is detected in the first feeder. A sample port assembly is also disclosed for obtaining a sample of material flowing through a processing system. The sample port assembly includes a port in the assembly and a sample cup holder adapted to be moved in the port to obtain a sample of material without substantially affecting the fluid pressure or flow within the system. The components of the chemical processing system can be used in processes to make carb…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.