Method of and apparatus for producing exposure mask
US6401235B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | May 21, 1998 |
| Grant date | Jun 4, 2002 |
| Priority date | — |
| Expiry date | May 21, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/68
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention provides a method and an apparatus for producing an exposure mask by which an exposure mask can be produced in a reduced production period and with a high degree of reliability. Data division which does not have an influence on a pattern of an exposure mask is indicated, and indication data which include a predetermined index code is retrieved from layout data to produce a file. Then, the layout data are divided in accordance with the file, and for each of the divided layout data, a corresponding one of processes is selectively performed in accordance with a condition. EB files produced by such processes are unified in accordance with the file to produce a plotting job.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.