Developer for photosensitive polyimide resin composition
US6403289B1 · kind B1 · utility
Assignees
Inventors
Key dates
| Filing date | Oct 30, 1998 |
| Grant date | Jun 11, 2002 |
| Priority date | — |
| Expiry date | Oct 30, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/037
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention relates to a developer for photosensitive polyimide resin compositions, comprising an alkaline aqueous solution containing a basic compound (A) represented by a formula (1): wherein X+ is N+ or P+, R is an alkyl group having 1 to 20 carbon atoms or an aryl group having 6 to 10 ring forming carbon atoms, Y− is a monovalent anion, m is 0 or 1, n is 3 or 4, and m+n is 4, with the proviso that when m is 0, n is 4, and R is an alkyl group, the total number of carbon atoms of 4 alkyl groups is at least 13, or when m is 1, n is 3, and R is an alkyl group, the total number of carbon atoms of 3 alkyl groups is at least 6.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.