Fused silica with constant induced absorption
US6403508B1 · kind B1 · utility
1Cited by
9References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 31, 2000 |
| Grant date | Jun 11, 2002 |
| Priority date | — |
| Expiry date | Jun 7, 2020 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2203/40
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
An optical member includes a fused silica glass having a concentration of ≡SiH moiety below detection limit as measured by Raman spectroscopy and a concentration of molecular hydrogen of at least 1×1017 molecules/cm3. The fused silica glass exhibits an induced absorption level which quickly attains an initial peak upon exposure to irradiation and rapidly decays to a low value. The induced absorption level after decaying to the low value remains substantially unchanged by further irradiation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.