Processing system and device manufacturing method using the same
US6406245B2 · kind B2 · utility
5Cited by
10References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 17, 1998 |
| Grant date | Jun 18, 2002 |
| Priority date | — |
| Expiry date | Mar 17, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67126
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A processing system is disclosed which includes first and second chambers, each for accommodating a processing apparatus therein, each chamber being able to be kept gas tight, a coupling member for coupling the processing apparatuses accommodated in the first and second chambers with each other, and an elastic gas tightness holding member for gas tightly sealing portions between the coupling member and the first and second chambers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.