CoPt-base sputtering target, method of making same, magnetic recording film and Co-Pt-base magnetic recording medium
US6406600B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Sep 14, 1999 |
| Grant date | Jun 18, 2002 |
| Priority date | — |
| Expiry date | Sep 14, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01F41/183
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Provided are a CoPt-base sputtering target which can produce a magnetic recording medium having a recording layer with uniform film characteristics and excellent recording and reproducing characteristics, a method of making this sputtering target, a magnetic recording film, and a CoPt-base magnetic recording medium. The CoPt-base sputtering target contains Co as the principal component, Pt as an indispensable element, and at least one element selected from the group consisting of the 4a group elements, 5a group elements, 6a group elements, B and C, and the target has a structure in which the maximum inscribed circle diameter of a phase consisting of a Pt simple substance is substantially not more than 500 &mgr;m and in which the thickness of a diffusion layer at the boundary of the Pt phase is substantially not more than 50 &mgr;m. By using this target, it is possible to obtain a magnetic recording film which is used in a hard disk, etc., having a uniform Pt distribution in which the difference in the analytical value of the Pt content measured in the radial direction of the disk is not more than ±10%.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.