Optical displacement measurement system
US6407815B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jul 1, 1999 |
| Grant date | Jun 18, 2002 |
| Priority date | — |
| Expiry date | Jul 1, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01D5/38
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An optical displacement measurement system that can detect the position of an object with an enhanced degree of resolution, wherein a coherent beam La is focussed on the lattice plane of a diffraction grating and, at the same time, a diffracted beam Lb is focussed on the light receiving plane of a light receiving means 3. The length of the optical path of any diffracted laser beam that passes through the aperture of a second focussing means 5 remains invariable. Therefore, if the optical axis of the diffracted beam Lb is deviated, the spot where it is focussed on the light receiving plane of the light receiving means 3 is not shifted and hence the length of the optical path will not change. Two diffracted laser beams having in equal length of optical path are made to interfere with each other in order to detect the phase difference. The displaced postion of the diffraction grating coherent beam La1 is then measured on the basis of the phase difference.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.