Micromachined x-ray image contrast grids
US6408054B1 · kind B1 · utility
14Cited by
10References
37Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 24, 1999 |
| Grant date | Jun 18, 2002 |
| Priority date | — |
| Expiry date | Nov 24, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K1/10
- WIPO fieldEngines, pumps, turbines
- WIPO sectorMechanical engineering
Abstract
Image contrast grids include a body having openings and an x-ray absorbing material in the openings. The openings can be formed by various micromachining techniques and the x-ray absorbing material can be formed in the openings by various coating and deposition techniques. The image contrast grids can have contoured surfaces for improved focusing capabilities. The image contrast grids can remove Compton scattered x-rays in two, non-normal dimensions. The openings can be formed with fine structures that are not visible in most imaging modes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.