Method for treating surfaces of substrates and apparatus
US6409842B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 8, 2000 |
| Grant date | Jun 25, 2002 |
| Priority date | — |
| Expiry date | Jan 25, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/427
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A method and apparatus for the treatment of surfaces of substrates of organic or inorganic materials, reactive fragments such as radicals or ions are produced by ultraviolet radiation from at least one ultraviolet radiator disposed at a given distance. The radiator has a gas-filled, elongated discharge chamber whose walls are formed by a dielectric, and the ultraviolet radiator is provided on the side facing away from the discharge chamber with at least one electrode. During irradiation, a translational and/or rotatory relative movement is performed between the substrate and the ultraviolet radiator at a comparatively slight distance between radiator and substrate surface, in order to achieve, in a simple manner, an intense and uniform illumination of the surface being irradiated. The treatment is directed especially to silicon substrates or glass substrates.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.