Rotatable sputter target
US6409897B1 · kind B1 · utility
27Cited by
12References
16Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 20, 2000 |
| Grant date | Jun 25, 2002 |
| Priority date | — |
| Expiry date | Sep 20, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/1372
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A rotatable sputter target for use in a sputtering system having a sleeve of sputtering material attached to a structural support tube such that an annular space is formed between the inside surface of the sleeve and the outside surface of the support tube. The annular space is at least partly filled with a thermally and electrically conductive material which flows at ambient temperature. The annular space is sealed at either end so that the material cannot escape the annular space.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.