Sputtering target and its manufacturing method
US6409965B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 21, 2000 |
| Grant date | Jun 25, 2002 |
| Priority date | — |
| Expiry date | Sep 21, 2020 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/3414
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An ingot is made from a used target of 30 weight % or more, and new metals of the same components, and recycled alloy powder is made by a gas atomizing process. Magnetic permeability is controlled not to exceed 2 by adjusting the content of rare earth metals in rare earth alloy powder to be at least 35 weight %. By blending the recycled alloy powder with other powder to produce alloy powder containing at least 50 weight % of rare earth alloy powder having a magnetic permeability not higher than 2 and containing at least 65 weight % of rare earth alloy powder. By sintering the alloy powder under pressure and thereafter cutting top, bottom and side surfaces of the sintered material, a target having a magnetic permeability not higher than 2 and having a thickness not less than 8 mm is fabricated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.