Interface texturing for light-emitting device
US6410348B1 · kind B1 · utility
56Cited by
5References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 1, 2000 |
| Grant date | Jun 25, 2002 |
| Priority date | — |
| Expiry date | Aug 1, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/918
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An interface texturing for light-emitting device is formed by utilizing holographic lithography. Two coherent light beams are overlaid to cause constructive and destructive interference and thereby periodical alternative bright and dark lines are formed. A wafer coated with photoresist material is exposed under the interference lines. After developing step, a photoresist pattern with textured surface is formed on the wafer. Thereafter, the textured photoresist pattern is transferred to the wafer by etching process and result in a desired interface texturing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.