Patent · US Expired

Optical waveguide element and method for manufacturing optical waveguide element

US6411765B1 · kind B1 · utility

29Cited by
5References
12Claims
0Family size

Assignee

Inventor

Key dates

Filing dateMar 23, 2000
Grant dateJun 25, 2002
Priority date
Expiry dateMar 23, 2020

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG02B2006/12147
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

According to the present invention, which provides a optical waveguide element achieving high performance and high yield, that makes it possible to form a complex light-wave circuit structure without requiring a larger mounting area and a optical waveguide element manufacturing method, a optical waveguide element 100 is provided with an Si substrate 102 and a first light-wave circuit layer 112 and a second light-wave circuit layer 120 sequentially laminated on the substrate 102. At the first light-wave circuit layer 112, a first optical waveguide structure constituted of a first clad layer 104 formed toward the substrate 102, a first core portion 108 and a second clad layer 110 formed toward the second light-wave circuit layer 120 is achieved. In addition, at the second light-wave circuit layer 120, a second optical waveguide structure constituted of a second core portion 116 and a third clad layer 118 at the second light-wave circuit layer 120 is achieved. Since the first light-wave circuit layer 112 and the second light-wave circuit layer 120 are directly laminated, a directional optical coupling is induced between the first core portion 108 and the second core portion 116.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.