Patent · US Expired

Device and method for cleaning semiconductor wafers

US6412500B1 · kind B1 · utility

3Cited by

6References

7Claims

0Family size

Assignee

Wacker Siltronic Gesellschaft Fur Halbleitermaterialien AG · DE

Inventors

Roland Brunner · Wien, AT
Franz Sollinger · Polling, DE
Hans-Joachim Luthe · Burgkirchen an der Alz, DE
Georg-Friedrich Hohl · Altötting, DE

Key dates

Filing date	Jan 7, 2000
Grant date	Jul 2, 2002
Priority date	—
Expiry date	Jan 7, 2020

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10S134/902
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

A device for cleaning semiconductor wafers with a cleaning liquid, includes a cleaning station with a plurality of rotating pairs of rollers which are arranged one behind another and to which the cleaning liquid is applied. Each pair of rollers is formed by a top roller and a bottom roller, and the semiconductor wafer is conveyed between the pairs of rollers. There is also a conveyor means for conveying the semiconductor wafer to and from the cleaning station. The conveyor means has a film of conveyor liquid which is provided by the conveyor and on which the semiconductor wafer is conveyed. A supplying container provides the cleaning liquid to the top rollers in the form of a falling liquid which migrates over the rollers. There is also a method for cleaning semiconductor wafers in which such a device is used.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.