Method for manufacturing thin-film magnetic head
US6413325B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 4, 1999 |
| Grant date | Jul 2, 2002 |
| Priority date | — |
| Expiry date | Nov 4, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49034
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method of manufacturing a thin-film magnetic head with a SVMR element which includes first and second layers of a ferromagnetic material (free and pinned layers) separated by a layer of non-magnetic electrically conductive material, and a layer of anti-ferromagnetic material formed in physical contact with the pinned layer. The method has a first temperature annealing (pin annealing) step of annealing the SVMR element under application of magnetic field to provide exchange coupling between the pinned layer and the anti-ferromagnetic material layer so that the pinned layer is pinned toward a predetermined direction, and a second temperature annealing (free layer annealing) step of annealing the SVMR element so that axis of easy magnetization of the free layer orients a direction substantially perpendicular to the predetermined direction. The free layer annealing is performed at a temperature lower than 150° C.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.