Magnetic polishing fluids
US6413441B1 · kind B1 · utility
18Cited by
10References
70Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | May 4, 2000 |
| Grant date | Jul 2, 2002 |
| Priority date | — |
| Expiry date | May 4, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/3212
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Magnetic polishing fluid compositions comprising various size colloidal and/or non-colloidal magnetic particle and colloidal size polishing particle compositions suitable for polishing ceramic and glass substrates are described. The compositions are usually aqueous compositions having highly basic pHs. Methods for preparing the various polishing fluids compositions are also discussed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.