Photocatalytically-activated self-cleaning article and method of making same
US6413581B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 1, 1999 |
| Grant date | Jul 2, 2002 |
| Priority date | — |
| Expiry date | Apr 1, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31855
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A method and article are disclosed wherein a substrate is provided with a photocatalytically-activated self-cleaning surface by forming a photocatalytically-activated self-cleaning coating on the substrate by spray pyrolysis chemical vapor deposition or magnetron sputter vacuum deposition. The coating has a thickness of at least about 500 Angstroms to limit sodium-ion poisoning to a portion of the coating facing the substrate. Alternatively, a sodium ion diffusion barrier layer is deposited over the substrate prior to the deposition of the photocatalytically-activated self-cleaning coating to prevent sodium ion poisoning of the photocatalytically-activated self-cleaning coating. The substrate includes glass substrates, including glass sheet and continuous float glass ribbon.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.