Electron source manufacturing method, and image forming apparatus method
US6416374B1 · kind B1 · utility
15Cited by
4References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 16, 1998 |
| Grant date | Jul 9, 2002 |
| Priority date | — |
| Expiry date | Sep 16, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J9/027
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method of manufacturing an electron source with electron emitting elements is provided. The method has a process of depositing a deposit substance in an area including at least an area of the electron emitting element from which area electrons are emitted. The depositing process is performed in an atmosphere of a gas containing at least a source material of the deposit substance, the gas having a mean free path allowing the gas to take a viscous flow state.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.