Discharge electrode, high-frequency plasma generator, method of power feeding, and method of manufacturing semiconductor device
US6417079B1 · kind B1 · utility
0Cited by
3References
17Claims
0Family size
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Key dates
| Filing date | Feb 8, 2001 |
| Grant date | Jul 9, 2002 |
| Priority date | — |
| Expiry date | Feb 8, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32577
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A discharge electrode improves the uniformity of discharge such as plasma. The electrical discharge electrode, which receives high-frequency power and produces a discharge, comprises an electrode body adapted to receive high-frequency power, and a member for preventing the reflection of high-frequency power from the electrode body. The electrical discharge may comprise plasma generated by an electrical discharge.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.