System for regulating pressure in a vacuum chamber, vacuum pumping unit equipped with same
US6419455B1 · kind B1 · utility
22Cited by
12References
25Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 21, 2000 |
| Grant date | Jul 16, 2002 |
| Priority date | — |
| Expiry date | Nov 21, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02B30/70
- WIPO fieldEngines, pumps, turbines
- WIPO sectorMechanical engineering
Abstract
The invention relates to a system for regulating the pressure in an enclosure (1) that is to contain processed gas for manufacturing semiconductor components or micro- or nano-technology devices, the enclosure being connected by pipework (2) to a pump unit (3) comprising a dry mechanical primary pump (4) and at least one secondary pump (5). According to the invention, the system further comprises a speed controller (6) controlling simultaneously the speeds of rotation of the dry mechanical primary pump (4) and of said at least one secondary pump (5).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.