Plasma display panel suitable for high-quality display and production method
US6419540B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 26, 2001 |
| Grant date | Jul 16, 2002 |
| Priority date | — |
| Expiry date | Sep 26, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J11/38
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A PDP does not suffer from dielectric breakdown though a dielectric layer is thin, with the problems of conventional PDPs, such as cracks appearing in the glass substrates during the production of the PDP being avoided. To do so, the surface of silver electrodes of the PDP is coated with a 0.1-10 &mgr;m layer of a metallic oxide, on whose surface OH groups exist, such as ZnO, ZrO2, MgO, TiO2, Al2O3, and Cr2O3. The metallic oxide layer is then coated with the dielectric layer. It is preferable to form the metallic oxide layer with the CVD method. The surface of a metallic electrode can be coated with a metallic oxide, which is then coated with a dielectric layer. The dielectric layer can be made of a metallic oxide with a vacuum process method or the plasma thermal spraying method. The dielectric layer formed on electrodes with the CVD method is remarkably thin and flawless. When the dielectric layer is formed with the vacuum process method or the plasma spraying method, warping and cracks conventionally caused by baking the dielectric layer are prevented. Here, borosilicate glass including 6.5% or less by weight of alkali can be used as the glass substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.