Use as phosphor dot in a plasma or x-ray system of a lanthanum phosphate comprising thulium
US6419852B1 · kind B1 · utility
5Cited by
3References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 3, 2000 |
| Grant date | Jul 16, 2002 |
| Priority date | — |
| Expiry date | Jul 3, 2020 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09K11/7777
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
The present invention relates to the use of a compound based on a thulium-containing lanthanum phosphate as a phosphor in a plasma or X-ray system. This phosphate may furthermore contain gadolinium. The thulium content of the compound, expressed in at % with respect to the lanthanum, is between 0.1 and 10, more particularly between 0.5 and 5. The invention also covers a lanthanum phosphate which is characterized in that it contains thulium and in that it consists of particles having a mean size of between 1 and 20 &mgr;m with a dispersion index of less than 0.6.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.