Plasma treatment of filter media
US6419871B1 · kind B1 · utility
43Cited by
11References
8Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | May 25, 2000 |
| Grant date | Jul 16, 2002 |
| Priority date | — |
| Expiry date | May 25, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T442/227
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The present invention is drawn to an improved electrostatic filter medium comprising a web of electret fibers which have been treated with fluorine-containing plasmas at a deposition amount of about 0.03 g/m2 to about 1.5 g/m2; electrostatically charged; rinsed; and dried. The present invention is further drawn to a method of producing non-woven webs which have been treated with a fluorine-containing plasma at a deposition amount of about 0.03 g/m2 to about 1.5 g/m2; electrostatically charged; rinsed; and dried.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.