Direct positive lithographic plate
US6420087B1 · kind B1 · utility
2Cited by
31References
37Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 30, 1999 |
| Grant date | Jul 16, 2002 |
| Priority date | — |
| Expiry date | Apr 30, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0757
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A positive working lithographic plate precursor comprising a support having a hydrophilic surface and a coating thereon comprising a positive working, photosensitive composition and an aryl alkyl polysiloxane. A method of preparing a positive working lithographic plate precursor comprising coating on a support having a hydrophilic surface a coating comprising, in admixture, a positive working photosensitive composition and an aryl alkyl polysiloxane.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.