Method for conditioning process chambers

US6420274B1 · kind B1 · utility

Assignee

• International Business Machines Corporation · US

Inventors

• John Baker · Keller, US
• Marc W. Cantell · Enosburg Falls, US
• Paul W. Pastel · Saint Johnsbury Center, US
• Alejandro G. Schrott · New York, US
• Ying Zhang · Santa Clara, US

Key dates

• Filing date: May 10, 2000
• Grant date: Jul 16, 2002
• Expiry date: May 10, 2020

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C16/4405
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A method for conditioning the inside walls of a process chamber is described incorporating a selected process gas such as Br, Br2, HBr, Cl2, HCl, F2, SiFx, and NF3, a pressure controller, and a timer for soaking the chamber. The invention overcomes the problem of running dummy product wafers to condition the chamber.