Patent · US Expired

Lead silicate glass and a process for setting a reduced surface resistance of the lead silicate glass

US6420291B1 · kind B1 · utility

1Cited by

4References

25Claims

0Family size

Assignees

Schott Glas · DE
Perkinelmer Optoelectronics · US

Inventors

Simone Monika Ritter · Mainz, DE
Peter Brix · Mainz, DE
Raimund Barden · Oestrich-Winkel, DE
Claus Nitsch · Groß-Rohrheim, DE
Wilfried Koudelka · Idstein, DE

Key dates

Filing date	May 17, 2000
Grant date	Jul 16, 2002
Priority date	—
Expiry date	May 17, 2020

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC03C3/07
WIPO fieldMaterials, metallurgy
WIPO sectorChemistry

Abstract

The invention relates to a lead silicate glass, to the use thereof for the production of secondary electron multipliers, and to a process for setting a reduced surface resistance of a lead silicate glass of this type. The lead silicate glass has the following composition (in % by weight): SiO2 15-35, PbO 35-55, Bi2O3>20-29, BaO 0-10, Cs2O 0-10, BaO+Cs2O 2-13, CaO 0-10, SrO 0-10, CaO+SrO+BaO 0-10, and up to 1% by weight of conventional fining agents. The surface resistance of the lead silicate glass after reduction in a hydrogen atmosphere is from 0.1 to 60 M&OHgr;/sq.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.