Quasi-continuous wave lithography apparatus and method
US6421573B1 · kind B1 · utility
42Cited by
5References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 27, 1999 |
| Grant date | Jul 16, 2002 |
| Priority date | — |
| Expiry date | May 27, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70383
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithography system for providing interconnections of integrated circuits on a substrate includes a laser system with a high reflector and an output coupler that define an oscillator cavity. A gain medium and a mode locking device are positioned in the oscillator cavity. A diode pump source produces a pump beam that is incident on the gain medium. A processor is coupled to the laser system and stores a representation of interconnections for the integrated circuit. An output beam directing apparatus is coupled to the processor and directs the output beam to the substrate and form the interconnections.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.