Polishing composition
US6423125B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 28, 2000 |
| Grant date | Jul 23, 2002 |
| Priority date | — |
| Expiry date | Aug 30, 2020 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09G1/02
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A polishing composition for magnetic disk substrates to be used for memory hard disks, which comprises:(a) water;(b) at least one phosphate. compound selected from the group consisting of a phosphate ester of ethoxylated alkylalcohol and a phosphate ester of ethoxylated arylalcohol;(c) at least one polishing accelerator selected from the group consisting of an inorganic acid and an organic acid, and their salts, other than the phosphate compound of component (b);(d) at least one abrasive selected from the group consisting of aluminum oxide, silicon dioxide, cerium oxide, zirconium oxide, titanium oxide, silicon nitride and manganese dioxide.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.