Photosensitive resin composition
US6423467B1 · kind B1 · utility
21Cited by
3References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 6, 1999 |
| Grant date | Jul 23, 2002 |
| Priority date | — |
| Expiry date | Apr 6, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/108
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photosensitive resin composition containing a high molecular compound having at least a) a fluoro aliphatic group, and b) a group represented by formula —L—P (wherein L represents a divalent organic group connected to the skeleton of the high molecular compound, and P represents an aromatic group having a carboxyl group at the ortho-position).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.