Patent · US Expired

Photo-addressable substrates and photo-addressable side-group polymers with highly inducible double refraction

US6423799B1 · kind B1 · utility

17Cited by
10References
2Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 17, 1998
Grant dateJul 23, 2002
Priority date
Expiry dateNov 17, 2018

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03H2240/52
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

Disclosed is an extremely rapidly photo-addressable storage media from inherently slow photo-addressable polymers by irradiating a substrate over a large area with a light source suitable for conventional inscription so that an optical anisotropy, i.e. a double refraction with a preferential direction in the plane of the substrate occurs. If the substrates so prepared are briefly intensively irradiated, the pattern is inscribed extremely rapidly and permanently. The invention also relates to novel side-chain polymers in which high optical anisotropy can be generated by irradiation. This optical anisotropy is very heat stable.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.