Photo-addressable substrates and photo-addressable side-group polymers with highly inducible double refraction
US6423799B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 17, 1998 |
| Grant date | Jul 23, 2002 |
| Priority date | — |
| Expiry date | Nov 17, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03H2240/52
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed is an extremely rapidly photo-addressable storage media from inherently slow photo-addressable polymers by irradiating a substrate over a large area with a light source suitable for conventional inscription so that an optical anisotropy, i.e. a double refraction with a preferential direction in the plane of the substrate occurs. If the substrates so prepared are briefly intensively irradiated, the pattern is inscribed extremely rapidly and permanently. The invention also relates to novel side-chain polymers in which high optical anisotropy can be generated by irradiation. This optical anisotropy is very heat stable.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.