Separate lateral processing of backscatter signals
US6424695B1 · kind B1 · utility
170Cited by
7References
9Claims
0Family size
Assignee
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Key dates
| Filing date | Dec 16, 1999 |
| Grant date | Jul 23, 2002 |
| Priority date | — |
| Expiry date | Dec 16, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K5/04
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system and a method for determining the depth of an object with respect to a surface behind which the object is concealed. The intensity of x-rays backscattered from the object is measured by at least two backscatter detectors disposed at different positions with respect to the scattering object. The depth of a scattering source within the volume penetrated by the x-rays is derived from the ratio of scattered x-rays measured by the detectors.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.