Holding device for a substrate

US6426860B1 · kind B1 · utility

Assignee

• Leica Microsystems Lithography · DE

Inventors

• Gerhard Schubert · Jena, DE
• Ulf-Carsten Kirschstein · Jena, DE
• Stefan Risse · Jena, DE
• Gerd Harnisch · Jena, DE
• Gerhard Kalkowski · Jena, DE
• Volker Guyenot · Jena, DE

Key dates

• Filing date: Sep 19, 2000
• Grant date: Jul 30, 2002
• Expiry date: Sep 19, 2020

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/6831
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

The present invention provides for a device for holding a substrate in an exposure system. In the exposure system, the substrate is positioned on a table movable in the X and Y coordinates of an X, Y plane, and the exposure system provides a metering assembly between a table surface and the substrate to adjust the distance and to align the substrate in relation to an exposure optics, from where a corpuscular radiation is directed right-angled onto a substrate surface, corresponding to the Z coordinate. The device for holding the substrate includes two mounting plates aligned parallel to the X, Y plane, adjusted upon the table in a direction to the exposure optics and with different distances to the table surface, the first mounting plate of which being directly connected to the table. The second mounting plate is connected with the first mounting plate through at least one holding device, and has a bearing plane for the substrate being designed on that side of the second mounting plate turned to the exposure optics.