Polymer compositions providing low residue levels and methods of use thereof
US6429285B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 8, 1999 |
| Grant date | Aug 6, 2002 |
| Priority date | — |
| Expiry date | Jan 8, 2019 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08J2367/04
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Polymer emulsion compositions presenting low levels of residue after thermolytic decomposition are provided. The compositions, based on polyhydroxyalkanoates or acrylics, are useful in a variety of applications, including the metallization of cathode ray tube phosphor screens, where use of the compositions provides enhanced luminosity and ease of manufacture. Other applications include use of the emulsion in additives used in powder molding techniques and in the manufacture of ceramic tiles.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.