Heating element for use in a hot filament chemical vapor deposition chamber
US6432206B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Feb 23, 2000 |
| Grant date | Aug 13, 2002 |
| Priority date | — |
| Expiry date | Feb 23, 2020 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/463
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A carbon deposition chamber is provided with several advantages. The heating filaments are permitted to expand and contract without breakage by permitting the electrode attached to one end of the filaments to move freely as the filaments change in length. The substrate is permitted to rotate back-and-forth to permit more even deposition of carbon films onto the substrate. The gas mixture used within the deposition process is expressed from tubing through three zones, which are each individually determined with needle valves. The substrate and the heating filaments are cooled to a temperature to prevent carbonization by permitting a cooling fluid to be passed through tubing connected to these elements in a heat sink like manner.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.