Polymeric photonic band gap materials
US6433931B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 10, 2000 |
| Grant date | Aug 13, 2002 |
| Priority date | — |
| Expiry date | Jan 10, 2020 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB82Y20/00
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A polymeric photonic band gap structure can be defined by a block copolymeric species, a mixture of homopolymers, or a combination optionally with appropriate dielectric contrast enhancing additives. The structure includes periodic, phase-separated microdomains alternating in refractive index, the domains sized to provide a photonic band gap in the UV-visible spectrum. A method of the invention involves creating a defect in a polymeric article including a periodic structure of a plurality occuring separate domains. The defect can be created by inserting into the material a plane of a material different from materials defining the polymeric article. According to another method of the invention, a defect is created in a polymeric article, including a periodic structure of a plurality of periodically occuring separate domains, by altering polymeric material in the article. The polymeric material can be altered by removing polymeric material via radiation, by exposing the material to intersecting beams of radiation, by removing the material via etching or the like. A defect can be created in one embodiment by magnetically guiding a defined by a block copolymeric species, a mixture of h…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.