Method for making an optical waveguide substrate
US6436728B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 18, 2001 |
| Grant date | Aug 20, 2002 |
| Priority date | — |
| Expiry date | Apr 18, 2021 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B33/005
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of making a high quality optical waveguide substrate is provided, in which the surface of a silicon substrate is oxidized through relatively large thickness and no foreign matter particles are adhered on the surface thereof. The silicon substrate to form a quartz film for the optical waveguide is mounted on a carbon contained ceramics sample base and is inserted into a carbon contained ceramics furnace core tube of which its external circumference is arranged in a heating furnace. When the inside of the furnace core tube is heated to 200 to 600° C. by the heating furnace, an oxidant gas for the silicon substrate surface is introduced, then by further heating up to 1200 to 1350° C., the silicon surface is thus oxidized.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.