Magnetic field element having a biasing magnetic layer structure
US6438026B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 8, 2001 |
| Grant date | Aug 20, 2002 |
| Priority date | — |
| Expiry date | Mar 8, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B2005/3996
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A magnetic field element provided with a stack of a first magnetic layer structure (7), a second magnetic layer structure (11) having a substantially fixed direction of magnetization (M11), and a spacer layer structure (9) separating the first magnetic layer structure and the second magnetic layer structure from each other. The magnetic field element is further provided with a biasing means for applying a longitudinal bias field to the first magnetic layer structure, which biasing means includes a thin biasing magnetic layer structure (3) located opposite to the first magnetic layer structure. The biasing magnetic layer structure provides a magnetic coupling field component (M3) perpendicular to the direction of magnetization of the second magnetic layer structure and is separated from the first magnetic layer structure by a non-magnetic layer structure (5). The first magnetic layer structure is ferromagnetically coupled to the biasing magnet layer structure. The magnetic field element is suitable for very high density applications.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.