Method and system for manufacturing a photocathode
US6440264B1 · kind B1 · utility
0Cited by
6References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 20, 1999 |
| Grant date | Aug 27, 2002 |
| Priority date | — |
| Expiry date | Sep 20, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J9/12
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A system for manufacturing a photocathode includes a cap having a first end and a second end. The first end defines a passage operable to direct an etch compound to an etch surface of the photocathode. The system also includes a support operable to releasably engage the cap to align the etch surface of the photocathode with the passage of the cap. The system also includes a plunger operable to extend through a passage in the support to secure the photocathode against the cap to confine the etch compound to the etch surface of the photocathode.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.