Multi-anode device and methods for sputter deposition
US6440280B1 · kind B1 · utility
8Cited by
20References
47Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 28, 2000 |
| Grant date | Aug 27, 2002 |
| Priority date | — |
| Expiry date | Jun 28, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3405
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method and apparatus for vacuum coating plural articles employs a drum work holder configuration and a sputter source with a plurality of individually controlled anodes for effectively providing uniform coatings on articles disposed at different locations on the drum work holder. A small number of measured process parameters are used to control a small number of process variable to improve coating uniformity from batch to batch.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.